Description
Day Cream with Chemical and Physical UV Protection is designed to provide reliable protection against photoaging and environmental stressors. It strengthens the stratum corneum and hydrolipid film, ensuring long-lasting hydration and skin softening. Thanks to its active ingredients, the cream eliminates dryness, reduces signs of irritation, and maintains optimal skin moisture levels.
Directions for Use:
Apply the cream with gentle massaging motions over the Optimal Hydrating Mask (Step 8) for maximum protection and hydration.
Active Ingredients:
- Ethylhexyl Methoxycinnamate & Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine: Provide chemical and physical UVA/UVB protection, preventing photoaging.
- Hyaluronic Acid & Glycerin: Deeply hydrate the skin, maintaining firmness and elasticity.
- Thermus Thermophillus Ferment: Offers antioxidant protection against free radical damage.
- Theobroma Cacao Seed Extract: Softens and nourishes the skin, promoting regeneration and comfort.
Ingredients:
Deionized water (Aqua), Cetearyl Alcohol&, Glyceryl Caprylate&, Glyceryl Stearate Citrate, Isopropyl Myristate, Ethylhexyl Methoxycinnamate, 1,2-Hexanediol&, Caprylyl Glycol&, Deionized water (Aqua)&, Sodium hyaluronate, Glycerin, Butyl Methoxydibenzoylmethane, Cetyl Alcohol, Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine, Glycerin&, Phenoxyethanol&, Potassium Sorbate&, Thermus Thermophillus Ferment, Butylene Glycol&, Deionized water (Aqua)&, Theobroma Cacao Seed Extract, Ethylhexylglycerin&, Phenoxyethanol, Apricot Kernel Oil Polyglyceryl-6 Esters&, Deionized water (Aqua)&
